The most important commercial application of anisotropic etching is in semiconductor chip processing, where photolithography is used to print resist lines on silicon wafers.
The fabrication process typically involves undercutting the cantilever structure to "release" it, often with an anisotropic wet or dry etching technique.
However, the low spectral resolution over "g" -factor at these wavebands limits the study of paramagnetic centers with comparatively low anisotropic magnetic parameters.
It then covers isotropic layered thin films, anisotropic and inhomogeneous media including crystals and birefringence, and guided waves using layered media.
